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EMI-Caused EOS Sources in Automated Equipment



EMI-Caused EOS Sources in Automated Equipment
This paper analyses sources of EMI-Caused EOS noise, how it affects components and how to mitigate this problem.
Production Floor

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Authored By:


Vladimir Kraz
OnFILTER, Inc.
Santa Cruz, CA

Summary


Electrical overstress causes damage to sensitive components, including latent damage. A significant source of EOS is high-frequency noise in automated manufacturing equipment. This paper analyses sources of such noise, how it affects components and how to mitigate this problem.

Conclusions


Electrical overstress is a serious and increasing threat to sensitive devices. Reduction of EOS exposure in assembly is an important way to improving yield and to reduce latent damage to the devices. High-frequency noise (EMI) in automated equipment is a significant source of electrical overstress.

Proper analysis of EMI environment in the facility and inside the tools, setting EOS limits for your process and proactive mitigation of EOS exposure improves yield and reduces EOS-caused failures.

Initially Published in the IPC Proceedings

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