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3 Ways to Increase Plasma Uniformity
Process temperature is the most important parameter in the plasma process. Process temperature has primary control over etch rate and has a secondary effect on etch uniformity. Read more.
Plasma Etch
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We are dedicated to continually innovate and develop the highest quality products and services to exceed even the most stringent cleanliness requirements. Whether implementing a new cleaning process, optimizing an existing one or preparing for future design changes, the use of our eight worldwide Technical Centers and global expert engineering teams that offer a wide variety of services and world-class cleaning support ensure a seamless transition.
ZESTRON has the products and services to keep your cleaning process performance at its best. As an ITAR registered company, ZESTRON can handle the most critically sensitive electronics cleaning challenges.
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ZESTRON Corporation
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