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3 Ways to Increase Plasma Uniformity
Process temperature is the most important parameter in the plasma process. Process temperature has primary control over etch rate and has a secondary effect on etch uniformity. Read more.
Plasma Etch
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![Diemat, Inc. Logo]()
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Diemat developed a low temperature, solder-glass preform for hermetically sealing optical fibers in optoelectronic packages. This technology replaces the more expensive soldering process, which requires fiber metallization. This low temperature glass technology is also utilized in hermetically sealing lenses for the optoelectronic industry, as well as hermetic sealing of package lids.
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Diemat, Inc.
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