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3 Ways to Increase Plasma Uniformity
Process temperature is the most important parameter in the plasma process. Process temperature has primary control over etch rate and has a secondary effect on etch uniformity. Read more.
Plasma Etch
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Trace Laboratories is a US based, internationally accredited, full service testing and analysis company, with two state-of-the art laboratories. Trace East in Maryland and Trace Central in Illinois, can address the full scope of your test and analysis requirements.
Our professionals have over 25 years experience with programs requiring strict adherence to existing specifications and custom programs designed around a specific requirement or company need. Contact either division for specific information regarding the services we offer.
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Trace Laboratories
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