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3 Ways to Increase Plasma Uniformity
Process temperature is the most important parameter in the plasma process. Process temperature has primary control over etch rate and has a secondary effect on etch uniformity. Read more.
Plasma Etch
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Manufacturers and designers of The Patented HIG (Harmonic Inductive Gain) induction heating systems, providing air and water cooled solutions for wire to connector, wire to PCB and component to PCB lead-free and leaded soldering applications.
iTherm's product line also includes coils and power supplies for medical device manufacturing, electronics assembly, precision heating, and custom solutions for clinical medical use for thermal therapies and material activations.
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iTherm Technologies
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